Pulsed laser deposition (PLD) was first reported in 1965 to investigate the deposition of thin films of a variety of materials including semiconductors, dielectrics, organometallics and chalcogenides.

While not impossible, replicating the machines and processes of a modern semiconductor fab is a pretty steep climb for the home gamer. Sure, we’ve seen it done, but nanoscale photolithography is a ...

A researcher at the Advanced Manufacturing Institute and the Texas Center for Superconductivity at the University of Houston (TCSUH) has found a way to reduce superconductor failures, enabled by a ...

While not impossible, replicating the machines and processes of a modern semiconductor fab is a pretty steep climb for the home gamer. Sure, we’ve seen it done, but nanoscale photolithography is a ...

In this pulsed laser deposition setup, an invisible laser emanating from outside the scene to the right, strikes targets in the lower and upper left, creating plasma plumes. The stream of atoms and ...

Industrial manufacturers and academic researchers can use patented, innovative laser techniques developed at Purdue University to produce high-tech materials such as semiconductor oxide thin films and ...

The major factors affecting the performance of crystalline thin films are the presence of grain boundaries and inherent crystal structure. Post-deposition annealing is frequently employed to improve ...

A group of researchers from Duke University in the U.S. has developed a new coating process for the creation of hybrid thin film materials. The researchers say their process allows for the creation of ...